脉冲偏压磁过滤电弧离子镀TiN薄膜的组织结构及耐磨性研究
Study on Microstructure and Wear Resistance of TiN Film by Pulsed Bias and Magnetic Filtered Arc Ion Plating
李晓芳, 张 岩, 田林海, 唐 宾
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作者单位：(太原理工大学 表面工程研究所, 山西 太原 030024)
中文关键字：电弧离子镀； 氮化钛薄膜； 脉冲偏压； 磁过滤； 耐磨性
英文关键字：arc ion plating; TiN film; pulsed bias; magnetic filtered; wear resistance
中文摘要：利用脉冲偏压磁过滤电弧离子镀在高速钢(M2)基底上沉积了厚约2.5 μm的TiN薄膜；分别采用FESEM、GDOES、 XRD和划痕试验法观察薄膜表面和断面形貌、测试薄膜成分及相结构，分析膜基结合强度，通过显微硬度计和球盘摩擦磨损试验机对比考察TiN薄膜和M2高速钢基体的硬度和耐磨性。 结果表明，TiN薄膜表面光滑致密，呈现致密柱状晶结构和明显的(111)择优取向， 膜基结合强度大于60 N，薄膜硬度约为26 GPa；脉冲偏压磁过滤电弧离子镀制备的TiN薄膜表现出很好的减摩和耐磨性能。
英文摘要：TiN film with thickness of about 2.5 μm was deposited on high-speed steel (M2) substrate by pulsed bias and magnetic filtered arc ion plating. The surface and cross-section morphologies, composition and phase structure were characterized by FESEM, GDOES and XRD, respectively. The adhesion between substrate and film was analyzed by scratch test. Hardness and wear resistance of TiN film were comparatively investigated with those of M2 substrate by microhardness test and ball on disc wear test. The results show that TiN film exhibits smooth surface, dense columnar grain structure and an obviously preferred orientation of TiN (111). The bonding strength exceeds 60 N. The hardness of the film is about 26 GPa. The TiN film shows excellent properties of anti-friction and wear resistance.