钴基合金叶片化学气相沉积渗铝层制备工艺

    Preparation of Aluminizing Layer by Chemical Vapor Deposition on Cobalt-base Alloy Blade

    • 摘要: 采用化学气相沉积(CVD)方法在钴基合金空心叶片内腔和外表面制备渗铝层,研究了渗层厚度、表面形貌、组织结构、元素浓度分布以及渗层对合金力学性能的影响。试验结果表明,采用1020℃×4 h在叶片表面制备的渗铝层,表面无翘皮、无鼓泡、无开裂等缺陷,渗铝层均匀、连续,能显著提高零件抗高温氧化及燃气腐蚀能力,且渗层对材料持久性能的影响不大。

       

      Abstract: The aluminizing layer was prepared by chemical vapor deposition(CVD) in the inner cavity and outer surface of cobalt-based alloy hollow blade. The thickness, surface morphology, microstructure, element concentration distribution and the influence of the layer on the mechanical properties of alloy were studied. The experimental results show that the aluminizing layer prepared on the blade surface with 1020 ℃×4 h has no defects such as warping, bubbling and cracking, the aluminizing layer is uniform and continuous. The high temperature oxidation resistance and gas corrosion resistance of the parts can be improved significantly, and the permeation layer has little effect on the durability of the materials.

       

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