Abstract: Non-stoichiometric TiCrN coatings were prepared by adjusting the rotational speed（0 r/min, 5 r/min,10 r/min,20 r/min） using the reactive magnetron co-sputtering technology. The influence of the nitrogen stoichiometric ratio on the phase composition, microstructure, bonding force and the electrical conductivity of TiCrN coatings were investigated. The results show that the nitrogen stoichiometric ratio of TiCrN coatings is less than 1, and it increases with the increase of rotational speed. The particles of the crystalline TiCrN coatings are nano-sized, and the size become coarser with the increase of the nitrogen stoichiometric ratio. The bonding force of TiCrN coating is consistent with the nitrogen stoichiometric ratio,and both of them increase with the rotational speed increasing. The variation of the resistivity of TiCrN coatings is the combined results of the geometric and electronic defects. The resistivity is highest due to the amorphous structure when the rotation speed is 0 r/min. When the rotational speed increases to 5 r/min, the geometrical defect makes the resistivity of TiCrN coating still high. When the rotation speed are 10 r/min and 20 r/min, after filling of more nitrogen atoms, the deformation of TiCrN crystal weakens and the geometric defects decrease, resulting in an obvious decrease of the resistivity. The electronic defects cause the resistivity of TiCrN coating at 20 r/min to be higher than that of the coating at 10 r/min.