工艺参数对316H奥氏体不锈钢表面双辉等离子渗铬层组织及硬度的影响

    Influence of Process Parameters on Microstructure and Hardness of Double-glow Plasma Chromizing Layer on 316H Austenitic Stainless Steel Surface

    • 摘要: 316H不锈钢因优异的耐蚀性和可加工性,已成为第四代核反应堆堆芯部件候选材料,但较差的耐磨性是其损耗的关键因素。利用双辉等离子技术在316H奥氏体不锈钢上制备了渗铬层,研究了保温时间、反应温度和源极电压对渗铬层微观组织的影响规律,并测试了渗铬层的硬度。结果表明:在等离子渗铬过程中,首先在试样表面形成Cr沉积层,然后Cr向内置换扩散形成Fe-Cr扩散层。当反应温度为900 ℃时,制备的渗铬层为双层结构,分为外侧的Cr沉积层和内侧的Fe-Cr扩散层。当反应温度升至1000 ℃及以上时,溅射至表面的Cr扩散充分,Cr沉积层消失,仅形成CrFe相的扩散层。在1000 ℃反应温度下,随反应时间延长,渗铬层厚度逐渐增加,在3 h后增加趋于缓和。源极电压主要影响Cr的供给量,随源极电压升高,渗铬层厚度逐步增加。为获得良好的渗铬层硬度,提升基体的耐磨性能,应保证渗铬层的厚度在30 μm以上,并保证渗铬层中Cr的含量,形成稳定的CrFe相层。此时,渗铬层的表面硬度达到900~1050 HV,是316H基体的5倍。

       

      Abstract: Owing to the excellent corrosion resistance and workability, 316H stainless steel has emerged as a candidate material for core components in Generation IV nuclear reactors. However, its relatively poor wear resistance remains a key factor limiting its service life. The double-glow plasma technique was employed to prepare chromizing layers on 316H austenitic stainless steel. The influence of holding time, reaction temperature, and source voltage on the microstructure of the chromized layer was systematically investigated, and the hardness of the chromized layers was tested. The results indicate that during the plasma chromizing process, a Cr deposition layer initially forms on the sample surface. Subsequently, Cr undergoes inward interdiffusion, leading to the formation of the Fe-Cr diffusion layer. When the reaction temperature is 900 ℃, the prepared chromized layer has a dual-layer structure, consisting of an outer Cr deposition layer and an inner Fe-Cr diffusion layer. When the reaction temperature rises to 1000 ℃ or above, the diffusion of Cr sputtered onto the surface becomes sufficient, and the Cr deposition layer disappears, leaving only a diffusion layer of CrFe phase. At a reaction temperature of 1000 ℃, the thickness of the chromized layer gradually increases with the extension of reaction time, and the increase tends to be moderate after 3 hours. The source voltage primarily influences the supply of Cr, and as the source voltage increases, the thickness of the chromized layer gradually increases. To achieve good hardness of the chromized layer and enhance the wear resistance of the substrate, it is necessary to ensure that the thickness of the chromized layer is above 30 μm, and the Cr content in the chromized layer should be maintained to form a stable CrFe phase layer. And the surface hardness of the chromized layer reaches 900-1050 HV, which is 5 times of that of the 316H substrate.

       

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